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Diffraction Equipment Product List and Ranking from 10 Manufacturers, Suppliers and Companies

Last Updated: Aggregation Period:Sep 17, 2025~Oct 14, 2025
This ranking is based on the number of page views on our site.

Diffraction Equipment Manufacturer, Suppliers and Company Rankings

Last Updated: Aggregation Period:Sep 17, 2025~Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. 一般財団法人材料科学技術振興財団 MST Tokyo//Testing, Analysis and Measurement
  2. サーモフィッシャーサイエンティフィック株式会社/Thermo Fisher Scientific K.K. Tokyo//Testing, Analysis and Measurement
  3. スペクトリス株式会社 マルバーン・パナリティカル事業部 Hyogo//Testing, Analysis and Measurement
  4. null/null
  5. 5 シエンタ オミクロン Tokyo//Testing, Analysis and Measurement

Diffraction Equipment Product ranking

Last Updated: Aggregation Period:Sep 17, 2025~Oct 14, 2025
This ranking is based on the number of page views on our site.

  1. ARL EQUINOX 100 X-ray diffractometer (XRD) サーモフィッシャーサイエンティフィック株式会社/Thermo Fisher Scientific K.K.
  2. Multipurpose X-ray diffraction device Empyrean スペクトリス株式会社 マルバーン・パナリティカル事業部
  3. X-ray diffraction method 一般財団法人材料科学技術振興財団 MST
  4. Fully Automatic Multi-Purpose X-ray Diffraction System: XRDynamic 500
  5. 4 Low-Energy Electron Diffraction Device 'LEED' シエンタ オミクロン

Diffraction Equipment Product List

1~15 item / All 32 items

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ARL EQUINOX 100 X-ray diffractometer (XRD)

An X-ray diffraction device (XRD) equipped with a unique CPS detector that can simultaneously acquire the full diffraction pattern in real time.

The tabletop ARL EQUINOX 100 X-ray diffractometer is a compact tabletop model that enables rapid analysis, in situ experiments, and analysis of crystal phase formation and transitions in materials research and development, dynamic behavior analysis, routine analysis for QA/QC in the pharmaceutical industry, and educational institutions such as universities. The ARL EQUINOX 100 is equipped with a unique CPSCPS (Curved Position Sensitive) detector, allowing for the simultaneous measurement of the entire diffraction pattern (up to 110°/2θ) in a short time. It also supports thin film measurements (GIXRD, XRR) and offers a variety of attachments depending on the measurement requirements.

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  • Analytical Equipment and Devices

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Multipurpose X-ray diffraction device Empyrean

From development to quality control! A super high-performance X-ray diffractometer that enables various forms of sample analysis.

The newly developed MultiCore Optics, equipped in the multipurpose X-ray diffraction device Empyrean, enables easy measurement of diverse samples with simple operations. With just one device, it features multipurpose XRD capabilities that capture various highlights of materials from powders to thin films, nanomaterials to solids, at different angles! Applications can be handled in various ways, from a simple configuration that adds a few slits and analysis software to the standard setup, to a top-performance configuration using dedicated optics, light sources, and detectors. 【Features】 ■ Evaluation of products with different raw materials and formulations ■ Strong support for urgent analysis of unknown samples or development products ■ Suitable for efficient measurement of diverse samples ■ Easy operation ■ Over 30% improvement in sample throughput ■ Over 40% higher sensitivity and speed for impurity detection ■ Reduction of errors and omissions in setting multiple measurement conditions ■ 30% reduction in user training time *For more details, please refer to our website.

  • Analytical Equipment and Devices
  • X-ray inspection equipment

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High-Pressure Reflection High-Energy Electron Diffraction (RHEED)

Regulating thin film growth! Providing diagnostic tools for real-time process monitoring.

"High-Pressure Reflection High-Energy Electron Diffraction (RHEED)" is high-pressure reflection high-energy electron diffraction. It provides a diagnostic tool for real-time in-situ process monitoring for PLD/PED systems. It adjusts thin film growth based on structural data from intensity and diffraction. 【Features】 ■ Adjusts thin film growth based on structural data from intensity and diffraction. *For more details, please refer to the PDF document or feel free to contact us.

  • Other energy equipment

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X-ray diffraction method

XRD is a method for obtaining information about the crystal structure of a sample from its diffraction pattern.

- Identification of crystalline substances is possible - Evaluation of crystal size (from a few nm to 100 nm) is possible - Evaluation of crystallinity is possible - Evaluation of orientation is possible - Evaluation of strain and stress is possible - Non-destructive analysis is possible Features of the equipment - Heating analysis is possible from room temperature to 1100°C - Micro-area measurement with a beam diameter of up to 100 μm is possible - Atmosphere control is possible with N2, He, Ar, and vacuum

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[Analysis Case] IGZO

Case studies of XRD and XRR analysis of oxide semiconductors.

The transparent oxide semiconductor IGZO thin film is being researched and developed as a TFT material for displays. IGZO is a material whose properties change significantly based on the composition of the film, the presence of oxygen vacancies, and crystallinity, making it important to consider the correlation with film quality. We will introduce a case where the crystallinity, film thickness, and film density of three types of IGZO thin films with different heating temperatures were measured and compared using XRD and XRR. It was confirmed non-destructively that crystallization progresses at high temperatures, resulting in higher film density.

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[Analysis Case] Identification of Pyrolysis Products by High-Temperature XRD

XRD measurement can be performed while increasing the temperature.

When materials undergo chemical reactions and phase changes with increasing temperature, performing XRD measurements while heating is effective. We present a case where high-temperature XRD measurements were used to identify the decomposition products of copper(II) sulfate pentahydrate. The results showed that the diffraction peaks changed at the temperature where decomposition occurred, clearly confirming the changes in the crystal structure. In MST, it is possible to conduct Out-of-plane XRD measurements and In-plane XRD measurements while heating.

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[Analysis Case] Evaluation of Metal Films by High-Temperature XRD

Tracking evaluation of phase transitions and crystallinity changes during the heating process.

For the sample where Pt was sputter-deposited on a Si substrate, Out-of-plane XRD and In-plane XRD measurements were conducted while increasing the temperature. In both measurements, it was observed that the peak intensity of Pt(111) increased and the full width at half maximum decreased at temperatures above 500°C, indicating that crystallization was progressing. Additionally, it was confirmed that as the temperature rose, thermal expansion caused the peaks to shift towards lower angles (the direction of increased lattice spacing).

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Types and Characteristics of Electron Diffraction

TEM: Transmission Electron Microscopy

The electron diffraction method using an electron microscope is classified into three types based on the way the electron beam is incident on the sample. The characteristics of each type and examples of data are presented. It is necessary to choose the appropriate method according to the size of the evaluation object and the analysis purpose.

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[Data DL available/EBSD] Measurement of internal strain in wire materials

By confirming the shape changes of the metal structure and measuring internal strain using EBSD, it is possible to determine whether the bending processes of leaf springs, hair springs, and others are appropriate.

Electron Backscatter Diffraction Pattern (EBSD) allows for the following when combined with a Scanning Electron Microscope (SEM): - Analysis of crystal orientation after cross-section formation - Confirmation of shape changes in metal microstructures and internal strain distribution In this case, we introduce "internal strain measurement of wire materials" using EBSD. This measurement technique is useful for determining whether bending processes, such as those for leaf springs and hair springs, are appropriate and for setting processing conditions. We encourage you to give it a try. Additionally, our company conducts various cross-sectional analyses using TEM and surface analysis using XPS, enabling multifaceted analytical evaluations. Both sales and technical staff are available to assist directly, so we would be grateful if you could feel free to consult with us. Seiko Future Creation Official Website https://www.seiko-sfc.co.jp/

  • Other metal materials
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  • Other microscopes

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Evaluation of crystallinity of ultra-thin films by high-temperature XRD.

An effective means to understand phase changes, chemical reactions, and changes in lattice constants due to temperature conditions!

We would like to introduce our "Evaluation of Crystallinity of Ultra-Thin Films using High-Temperature XRD." High-temperature X-ray diffraction (XRD) is an effective method for understanding phase changes, chemical reactions, and changes in lattice constants of various materials under different temperature conditions. In the attached PDF document, we present a case study evaluating the changes in the crystal structure of nm-order ultra-thin films using In-Plane XRD and high-temperature measurements, so please take a look. 【Features of High-Temperature + In-Plane XRD】 ■ A method that involves incident X-rays at very low angles and scans the detector in the in-plane direction ■ The incident X-rays do not penetrate deeply from the surface and can only detect diffraction planes that are perpendicular to the surface ■ Information about crystals can be obtained even for ultra-thin films of a few nm *For more details, please download the PDF or feel free to contact us.

  • Other analysis and evaluation services

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Quantitative analysis of X-ray diffraction data using Rietveld refinement.

For applications such as evaluating the particle size and strain of positive/negative electrode materials in the charge and discharge process of secondary batteries!

We would like to introduce our "Quantitative Analysis of X-ray Diffraction Data Using Rietveld Analysis." By applying Rietveld analysis to X-ray diffraction data, it is possible to quantify the mass fraction of crystalline phases, crystallite size, and uniform strain in the sample without the need for standard samples. Please feel free to contact us if you have any inquiries. 【Features】 ■ Quantification of the mass fraction of crystalline phases, crystallite size, and uniform strain in the sample without the need for standard samples. *For more details, please download the PDF or feel free to contact us.

  • Other analysis and evaluation services

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Thin Film X-ray Diffraction (XRD)

It is possible to evaluate the crystallinity of thin films using In-Plane XRD and measure the physical properties of thin films using XRR!

We would like to introduce our "Thin Film X-ray Diffraction (XRD)." In addition to identifying the crystal structure of thin films at the nanometer level, we can also analyze the film density, thickness, and roughness of multilayer films through X-ray reflectivity measurements. By incidenting X-rays with good parallelism at a very shallow angle to the sample, we can achieve an extremely shallow penetration depth of the X-rays, allowing for the evaluation of thin film crystallinity using In-Plane XRD and the measurement of thin film physical properties using XRR. 【Features】 ■ In-Plane XRD (In-Plane Rotation Measurement) Evaluation of crystalline thin films at the nanometer level ■ XRR (X-ray Reflectivity Measurement) Evaluation of film density, thickness, and (surface/interface) roughness ■ Support for general thin film methods (fixed θ 2θ scanning) *For more details, please download the PDF or feel free to contact us.

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EBSD main analysis method

EBSD allows for the evaluation of the crystal structure and crystal orientation of materials.

Our company is capable of EBSD analysis using appropriate methods according to the research objectives.

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Tabletop X-ray diffractometer (XRD) Aeris

【2021 Introduction of Transmission Measurement and Thin Film Measurement Options】 Desktop X-ray Diffraction Device (XRD)! A high-sensitivity analysis instrument capable of detecting crystal phases at concentrations below 1%.

Spectris plc's Malvern Panalytical division has launched a significantly upgraded model of the benchtop powder X-ray diffractometer, Aeris. With the expanded capabilities for thin film XRD (GIXRD) measurements, it is now possible to measure the crystallinity and residual stress of thin films and coating materials. Additionally, the enhancement of the transmittance measurement function reduces the influence of orientation during sample preparation, allowing for more accurate data even from samples like formulation materials. This renewal has enabled the incorporation of functions that were previously only available on large floor-standing systems. The new Aeris is a versatile benchtop X-ray diffractometer that can efficiently provide high-quality data from polycrystalline materials and is designed for use in all environments. Moreover, the user-friendly operability, the safe design that alleviates concerns about X-ray exposure, and the same analysis software capable of detailed analysis as the large floor-standing systems, which were well-regarded in the previous Aeris, have been thoroughly carried over in this renewal. For detailed product descriptions, measurement case studies, or requests for quotes, please feel free to contact us!

  • Analytical Equipment and Devices
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